Foreign-Trade Zone (FTZ) 75, Notification of Proposed Production Activity; Intel Corporation; (Semiconductor Products); Chandler, Arizona

Document Headings Document headings vary by document type but may contain the following: the agency or agencies that issued and signed a document the number of the CFR title and the number of each part the document amends, proposes to amend, or is directly related to the agency docket number / agency internal file number the RIN which identifies each regulatory action listed in the Unified Agenda of Federal Regulatory and Deregulatory Actions See the Document Drafting Handbook for more details. Department of Commerce Foreign-Trade Zones Board [B-89-2026] Intel Corporation submitted a notification of proposed production activity to the FTZ Board (the Board) for its facilities in Chandler, Arizona within Subzone 75C. The notification conforming to the requirements of the Board's regulations ( 15 CFR 400.22 ) was received on July 16, 2026. Pursuant to 15 CFR 400.14(b) , FTZ production activity would be limited to the specific foreign-status material(s)/component(s) and specific finished product(s) described in the submitted notification (summarized below) and subsequently authorized by the Board. The benefits that may stem from conducting production activity under FTZ procedures are explained in the background section of the Board's website—accessible via www.trade.gov/​ftz . The proposed finished product(s) and material(s)/component(s) would be added to the production authority that the Board previously approved for the operation, as reflected on the Board's website. The proposed finished products include: High Precision Quartz Photomasks; Semiconductor transducers; Printed Circuits; and Electronic integrated circuits (duty free). The proposed foreign-status materials/components include: Corundum; Methane (liquid); Methane (gas); Chlorine; Argon; Oxygen; ( printed page 46768) Hydrogen; Helium; Xenon; Nitrogen; Hydrogen Chloride; Sulfuric Acid; Nitric Acid; Phosphoric Acid; Hydrofluoric Acid; Silicate reagent; Hydrogen Bromide; Carbon dioxide; Silica; Carbo…