Foreign-Trade Zone (FTZ) 18, Notification of Proposed Production Activity; Intel Foundry Corporation; (Semiconductor Products); Santa Clara, California

Document Headings Document headings vary by document type but may contain the following: the agency or agencies that issued and signed a document the number of the CFR title and the number of each part the document amends, proposes to amend, or is directly related to the agency docket number / agency internal file number the RIN which identifies each regulatory action listed in the Unified Agenda of Federal Regulatory and Deregulatory Actions See the Document Drafting Handbook for more details. Department of Commerce Foreign-Trade Zones Board [B-4-2026] Intel Foundry Corporation (Intel) submitted a notification of proposed production activity to the FTZ Board (the Board) for its facilities in Santa Clara, California within FTZ 18. The notification conforming to the requirements of the Board's regulations ( 15 CFR 400.22 ) was received on January 14, 2026. Pursuant to 15 CFR 400.14(b) , FTZ production activity would be limited to the specific foreign-status material(s)/component(s) and specific finished product(s) described in the submitted notification (summarized below) and subsequently authorized by the Board. The benefits that may stem from conducting production activity under FTZ procedures are explained in the background section of the Board's website—accessible via www.trade.gov/​ftz . The proposed finished product is photomasks (duty-free). The proposed foreign-status materials/components include: calcium hydroxide; propane; chlorine; iodine; fluorine gas; hydrogen; argon; helium; xenon; nitrogen; hydrochloric acid; sulfuric acid; nitric acid; carbon dioxide; ammonia; ammonium hydroxide; sodium hydroxide; potassium hydroxide; zinc chloride; sodium bisulfite; lithium cobalt oxide; hydrogen peroxide; toluene; trifluoroethane; tetrafluoromethane; methanol; isopropyl alcohol; propanediol; acetone; methyl ethyl ketone; cyclohexanone; oxalic acid; citric acid; triethanolamine; tetraethylammonium perfluoro octane sulfonate; acetonitrile; tungsten hexacar…